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[Patent] High Resolution Projection Micro-Stereolithography System And Method


Abstract:

A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.

Publication number US20170057162 A1 Publication type Application Application number US 15/352,051 Publication date Mar 2, 2017 Filing date Nov 15, 2016 Priority date May 28, 2010 Also published as US9492969, US20150309473 Inventors Christopher M. Spadaccini, Todd Weisgraber, George Farquar, Steven Gemberling, Nicholas Fang, Matthew Alonso, Jun Xu, Howon Lee, Original Assignee Christopher M. Spadaccini, Todd Weisgraber, George Farquar, Steven Gemberling, Nicholas Fang, Matthew Alonso, Jun Xu, Howon Lee,

Link: https://www.google.com/patents/US20170057162

#03272017 #stereolithographic #SLM #MaterialScience

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